History
Includes the device achievement of Oki Electric Industry Co., Ltd. and OKI SEMICONDUCTOR CO., LTD. which are the predecessor of LAPIS Semiconductor Co., Ltd.
:Facilities
:Technologies/Products
| 1961 | Building No.1 completed |
Production of transistors |
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| 1962 | Building No.2 and No.3 completed |
Production of millimeter wave tubes and electronic computers |
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| 1965 | Production of reed relays / Development of ICs started |
| 1966 | Production of reed switches |
| 1967 | Production of ICs |
| 1968 | Development CMOS ICs started |
| 1969 | Building No.4 completed |
Production of printed circuit boards |
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| 1975 | (Operations begun at Chichibu plant) |
Production of 4Kb DRAM |
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| 1977 | VLSI Laboratory No.1 completed |
Production of microprocessors |
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| 1979 | Production of microcomputers |
| 1980 | Administration/Technology Center completed |
| 1981 | (Operations begun at Miyazaki Oki Electric) |
Production of gate arrays and 64kb DRAMs (3μm design rules used) |
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| 1982 | Technology transfer to National Semiconductor Inc. |
| 1983 | VLSI Laboratory No.2 completed |
(M2 Plant completed at Miyazaki Oki Electric) |
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| 1984 | (Oki Micro Design Miyazaki established) |
Production of 256kb DRAMs (2μm design rules used) |
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| 1985 | VLSI Laboratory No.3 completed |
| 1987 | Production of 1Mb DRAMs (1.2μm design rules used) |
| 1988 | (Operations begun at Miyagi Oki Electric) |
| 1989 | Production of 4Mb DRAMs (0.8μm design rules used) |
| 1990 | (Operation begun at Oregon Plant in U.S.) |
(Oki LSI Technology Kansai established) |
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| 1991 | (M3 Plant completed at Miyazaki Oki Electric) |
| 1992 | (Operations begun at Thailand Plant) |
ULSI Laboratory No.1 completed |
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Production of 16 Mb DRAMs (0.5μm design rules used) |
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| 1994 | 256Mb DRAMs (0.25μm design rules used) successfully developed |
| 1995 | (S2 Plant completed at Miyazaki Oki Electric) |
Production of SSD cards |
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| 1996 | New Cafeteria Building completed (Building No.6) |
| 1997 | New Administration/Technology Center completed (Building No.7) |
Production of 64Mb DRAMs (0.3μm design rules used) |
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1Gb DRAMs (0.18μm design rules used) successfully developed |
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| 1998 | Business based SPA started |
Surface-mount Optical Network Modules commercialized |
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USB Control LSIs commercialized |
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| 2000 | Bluetooth System LSIs commercialized |
μPLAT developed |
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| 2002 | Production of LSIs using Fully Depleted SOI-CMOS technology |
| 2003 | Long-Wave Time Code Receiver based on SOI-CMOS technology successfully developed, an industry first |
| 2004 | Semiconductor Bases in Shenzhen, Beijing and Shanghai established |
| 2005 | Semiconductor Business Group established |
| 2007 | Silicon Microdevice Company established |
| 2008 | OKI SEMICONDUCTOR CO.,LTD. established |
| 2011 | The company name changed to LAPIS Semiconductor Co., Ltd. |
